An Assessment of the National Institute of Standards and by National Research Council, Division on Engineering and

By National Research Council, Division on Engineering and Physical Sciences, Board on Assessment of National Institute of Standards and Technology Programs

The nationwide Institute of criteria and expertise (NIST) Measurements and criteria Laboratories (MSL) supply technical management for the nation's size and criteria infrastructure and guarantee the provision of crucial reference information and size functions. At NIST's request, the nationwide examine Council (NRC) includes out a biennial review of the seven MSL. The evaluation makes a speciality of each one laboratory's technical caliber and benefit; and effectiveness. It additionally examines the relevance of the NIST courses and the way good laboratory amenities, apparatus, and body of workers may be able to fulfil the MSL undertaking. This record provides an total review of the MSL by means of distinctive exams of every of the seven laboratories.

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The Realization of the SI Farad and Ohm project maintains and disseminates the farad and ohm. S. legal farad to the SI. S. industrial base with consistent, reproducible, reliable, and traceable electrical measurement calibration in these areas. The Realization of the SI Farad and Ohm project merits recognition for maintenance of the farad and ohm standards. This may not be as innovative or exciting as other work in the division, but it is important and fundamental to NIST’s role. The project has two particularly innovative areas of technical focus—that of the calculable capacitor and research on using QH resistance for AC measurements.

A 200-mm silicon wafer linewidth metrology standard was delivered to International SEMATECH in 2001. 5 nm (3 sigma). The division expects to deliver a standard in 2002 that permits measurements in the 60- to 90-nm range with a precision of +/−7 nm (3 sigma). A commercial supplier has been qualified for volume production of the new three-dimensional standard. The Scanning-Probe Microscope Metrology project continues to provide leadership in the application of scanning-probe microscopy to semiconductor device dopant profiling.

The project is now starting to tackle problems such as speckle in rear projection systems and near-eye display measurements. This work is expected to result in additional VESA standards for measurement. Program Relevance and Effectiveness The Electronic Kilogram project exemplifies the division’s ability to meet traditional objectives using modern approaches. The unit of mass is currently based on a physical artifact whose copies differ by non-negligible amounts. Numerous national measurement institutes (NMIs) are making efforts to replace these artifacts with standards based on a fundamental property of nature.

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